The name AZ is taken from the photochemical compound diAZo, first developed around 1943 to create photosensitive offset printing plates, then used for photoresists in integrated circuits and now also used in flat panel displays.

AZ has been at the forefront of photoresist technology since developing the first photoresist in the 1950’s. AZ sold the first broadband series photoresists under the AZ® trademark in 1962 and became the first supplier of photoresists to the flat panel industry in the 1980’s.

Through its continuing investment in technology, AZ has also developed other innovative products used to make semiconductors, such as RELACS and polysilizane, as well as anti-reflective coatings and related products such as developers, strippers and edge bead removers.

Our strategic alliance with Rohm and Haas seeks to increase the development rate and suitability of new CMP slurry (colloidal silica) products, harnessing their global reach and application capabilities to our excellence in R&D, technology and manufacturing know-how.